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Chemical vapor deposition in the titanium-carbon system

1971; Elsevier BV; Volume: 24; Issue: 1 Linguagem: Inglês

10.1016/0022-5088(71)90167-6

1878-2728

J.J. Nickl, M. Reichle,

Diamond and Carbon-based Materials Research

Various forms of titanium carbide single crystals and polycrystalline layers were deposited on graphite substrates from a vapor phase consisting of hydrogen, titanium- and carbon tetrachloride, in the temperature range 1200 °–1600 °C. The correlation between the carbon content of the vapor phase and the solid phase (TiC; TiC + C) was investigated; the influence of the graphite substrate on this relationship was examined. The morphology and properties of the deposition products are described. Octahedral single crystals of titanium carbide, TiC1.00, especially were deposited. Deposition of other phases such as dititanium carbide, Ti2C, titanium dicarbide, TiC2, or any modification of titanium or carbon as a single phase could not be detected. The latter observation contradicts any mechanism by which a pyrolytic carbon deposition is assumed as a first reaction step in the deposition of titanium carbide.