Thin film growth in the ultra-vacuum of space: The second flight of the Wake Shield Facility
1996; American Institute of Physics; Linguagem: Inglês
10.1063/1.49945
ISSN1935-0465
AutoresA. Ignatiev, A. Bensaoula, Steven Brock, Nick Combs, A. Freundlich, Charles Horton, Steven Pei, Mark Sterling, Ron Sega,
Tópico(s)Astro and Planetary Science
ResumoThe Wake Shield Facility (WSF) created to characterize and utilize the ultra‐vacuum of space has flown its second mission on Endeavor, STS‐69 in September, 1995. In its second flight the WSF flew free behind the Orbiter at a nominal distance of 25 nmi, grew four semiconductor thin film samples by molecular beam epitaxy, and one oxide thin film sample through the use of LEO atomic oxygen. The semiconductor thin films were in the III‐V semiconductor area with focus on AlGaAs/GaAs system. The WSF also generated an ultra‐vacuum consistent with past predictions of space wake vacuum levels. In addition, eleven cooperative experiments were flow on the WSF yielding additional information on the low earth orbit space environment.
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