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Focussed ion beam nanotomography reveals the 3D morphology of different solid phases in hardened cement pastes

2010; Wiley; Volume: 241; Issue: 3 Linguagem: Inglês

10.1111/j.1365-2818.2010.03433.x

1365-2818

Pavel Trtik, Beat Münch, P. Gasser, Andreas Leemann, Roman Loser, Roger Wepf, Pietro Lura,

Advanced X-ray Imaging Techniques

Journal of MicroscopyVolume 241, Issue 3 p. 234-242 Focussed ion beam nanotomography reveals the 3D morphology of different solid phases in hardened cement pastes P. TRTIK, P. TRTIK Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorB. MÜNCH, B. MÜNCH Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorP. GASSER, P. GASSER ETH Zürich, Electron Microscopy Centre (EMEZ), Zürich, SwitzerlandSearch for more papers by this authorA. LEEMANN, A. LEEMANN Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorR. LOSER, R. LOSER Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorR. WEPF, R. WEPF ETH Zürich, Electron Microscopy Centre (EMEZ), Zürich, SwitzerlandSearch for more papers by this authorP. LURA, P. LURA Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this author P. TRTIK, P. TRTIK Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorB. MÜNCH, B. MÜNCH Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorP. GASSER, P. GASSER ETH Zürich, Electron Microscopy Centre (EMEZ), Zürich, SwitzerlandSearch for more papers by this authorA. LEEMANN, A. LEEMANN Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorR. LOSER, R. LOSER Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this authorR. WEPF, R. WEPF ETH Zürich, Electron Microscopy Centre (EMEZ), Zürich, SwitzerlandSearch for more papers by this authorP. LURA, P. LURA Empa, Swiss Federal Laboratories for Materials Science and Technology, Dübendorf, SwitzerlandSearch for more papers by this author First published: 09 September 2010 https://doi.org/10.1111/j.1365-2818.2010.03433.xCitations: 23 Pavel Trtik, Empa, Überlandstr. 129, CH-8600, Dübendorf, Switzerland. Tel: +41 44 823 4299; fax: +41 44 823 4035; e-mail: [email protected] Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat Summary Due to the development of integrated low-keV back-scattered electron detectors, it has become possible in focussed ion beam nanotomography to segment not only solid matter and porosity of hardened cement paste, but also to distinguish different phases within the solid matter. This paper illustrates a method that combines two different approaches for improving the contrast between different phases in the solid matrix of a cement paste. The first approach is based on the application of a specially developed 3D diffusion filter. The second approach is based on a modified data-acquisition procedure during focussed ion beam nanotomography. A pair of electron images is acquired for each slice in the focussed ion beam nanotomography dataset. The first image is captured immediately after ion beam milling; the second image is taken after a prolonged exposure to electron beam scanning. 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