Portal de Periódicos da CAPES

Direct comparison of EUV and visible-light interferometries

1999; SPIE; Volume: 3676; Linguagem: Inglês

10.1117/12.351138

1996-756X

Kenneth A. Goldberg, Patrick Naulleau, Sang Hun Lee, Chang-Hasnain C. Chang, Cynthia J. Bresloff, Richard J. Gaughan, Henry N. Chapman, J. E. M. Goldsmith, Jeffrey Bokor,

Optical measurement and interference techniques

Recent experiments with four 10x EUV imaging systems provide the first direct comparisons of visible-light and at- wavelength EUV interferometers performed using the state-of- the-art measurement tools that will be used to assemble and align the next generation of EUV imaging systems. Measurements from four individual multilayer-coated Schwarzschild objectives are discussed. Favorable agreement has been achieved between EUV and visible-light system wavefront measurements in all four optical systems. Measurements made in the presence of surface contamination and multilayer thickness variation, however, do show expected localized differences between the two measurements.