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Effect of laser parameters on the exposure and selective etch rate in photostructurable glass

2002; SPIE; Volume: 4637; Linguagem: Inglês

10.1117/12.470631

1996-756X

Frank E. Livingston, W. W. Hansen, Adam Huang, Henry Helvajian,

Semiconductor materials and devices

Photostructurable glass-ceramic materials have received significant attention due to their utility in aerospace engineering and micro technology. For example, the ability to fabricate structures in glass is important in the design and integration of micro scale electronic, optical and fluidic devices. Direct-write pulsed UV laser processing techniques have been utilized recently to create patterned 3D microstructures in a lithium-aluminosilicate glass. The direct-write microfabrication process involves the formation of an initial latent image in the glass via UV laser radiation. Thermal-induced ceramization is utilized to develop the latent image into a permanent image. Material removal and microstructure fabrication are then accomplished by preferential isotropic etching of the developed regions.