Lithium Phosphorus Oxynitride Thin Film Fabricated by a Nitrogen Plasma-Assisted Deposition of E-beam Reaction Evaporation
2004; Electrochemical Society; Volume: 7; Issue: 9 Linguagem: Inglês
10.1149/1.1778934
ISSN1944-8775
AutoresWenyuan Liu, Zheng‐Wen Fu, Chilin Li, Qi‐Zong Qin,
Tópico(s)Metal and Thin Film Mechanics
ResumoLithium phosphorus oxynitride (Lipon) thin films have been fabricated successfully by nitrogen plasma-assisted deposition of E-beam reactive evaporated for the first time. The effect of inductively coupled plasma (ICP) powers on the electrical and optical properties of Lipon thin film was investigated. X-ray photoelectron spectra confirmed that the insertion of N into and N concentration were dependent on ICP powers. Infrared and UV-vis spectrophotometry were used to characterize their optical properties. The electrical properties of the as-deposited Lipon thin films were investigated by impedance spectroscopy and isothermal transient ionic current measurements. © 2004 The Electrochemical Society. All rights reserved.
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