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30 - nm -wide aluminum nanowire grid for ultrahigh contrast and transmittance polarizers made by UV-nanoimprint lithography

2006; American Institute of Physics; Volume: 89; Issue: 14 Linguagem: Inglês

10.1063/1.2358813

1520-8842

Jim J. Wang, Lei Chen, Xiaoming Liu, P.F. Sciortino, Feng Liu, F.S. Walters, Xuegong Deng,

Advancements in Photolithography Techniques

Both high contrast and high transmittance are preferred for optical polarizers. To achieve high transmittance for aluminum nanowire-grid polarizers, a narrow linewidth is required. In this letter, aluminum nanowire-grid polarizers with 30-nm-wide linewidth and 200nm depth were fabricated by UV-nanoimprint lithography, which leads to ultrahigh transmittance. To achieve a high contrast, the authors fabricated the 30-nm-wide aluminum nanowire structures on both sides of the glass wafers. An extremely high contrast up to 10 000:1 was achieved, in the visible range, along with good transmittance of 83%–87% for the double-side aluminum nanowire-grid polarizers.