Dedicated STEM for 200 to 40 keV operation
2011; EDP Sciences; Volume: 54; Issue: 3 Linguagem: Inglês
10.1051/epjap/2011100429
ISSN1286-0050
AutoresNiklas Dellby, Nicholas J. Bacon, P. Hrncirik, Matthew F. Murfitt, Gwyn Skone, Zoltán Szilágyi, Ondrej L. Krivanek,
Tópico(s)Electronic and Structural Properties of Oxides
ResumoA dedicated STEM developed for operation at primary energies from 200 keV to 40 keV and lower is described. It has a new cold field emission gun (CFEG) that gives a normalized brightness of 3 × 108 A/(m2 sr V), and excellent short-term and long-term stability. It includes two gun lenses (one electrostatic and one electromagnetic), a fast electrostatic beam blanker, three condenser lenses, a corrector of third- and fifth-order geometric aberrations, an objective lens with low aberration coefficients, a flexible set of projector lenses, an ultra-stable sample stage, and provision for storing up to five samples under high vacuum and loading them into the microscope's objective lens under remote control. The microscope is enclosed in a magnetically and acoustically shielding enclosure, which allows it to operate at a high performance level even in non-optimal environments. It has reached 53 pm resolution at 200 keV and 123 pm at 40 keV, and an EELS energy resolution of 0.26 eV.
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