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Fuzzy pattern matching techniques for photomask layout data

2013; SPIE; Volume: 8701; Linguagem: Inglês

10.1117/12.2027851

1996-756X

Kokoro Kato, Yoshiyuki Taniguchi, Kuninori Nishizawa,

Industrial Vision Systems and Defect Detection

Pattern matching seems to be promising technique to the mask industry. It can be used for many applications such as hot spot detection of post-OPC data, search of AIMS reference location or CDSEM measurement point extraction. In particular, fuzzy pattern matching is more needed for mask data processing because the mask layout has different derivatives generated by OPC and there are many similar "OPC brothers" that come from the same layout. However, application of fuzzy pattern matching to the mask layout is challenging due to the reasons related to the characteristics of photomask data. In this paper we introduce a novel method of fuzzy pattern matching to cope with the issues that comes from the characteristics of mask data. The rule specification is quite simple - we only need to specify a single tolerance value for each edge displacement. We will show the experimental results using the actual mask layout and prove that the calculation speed and quality of the proposed technique is satisfactory from the view point of realistic MDP processing.