Crystallization and silicon diffusion nanoscale effects on the electrical properties of Al2O3 based devices
2009; Elsevier BV; Volume: 86; Issue: 7-9 Linguagem: Inglês
10.1016/j.mee.2009.03.020
ISSN1873-5568
AutoresMario Lanza, M. Porti, M. Nafrı́a, X. Aymerich, Günther Benstetter, Edgar Lodermeier, H. Ranzinger, G. Jaschke, S. Teichert, L. Wilde, Paweł Piotr Michałowski,
Tópico(s)Nanowire Synthesis and Applications
ResumoIn this work, Atomic Force Microscopy (AFM) based techniques are used to study, at the nanoscale, the dependence of the electrical properties of Al2O3 stacks for Flash memories on the percent of diffused Silicon and material crystallization after being annealed at different temperatures.
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