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Magnetoresistance of Co-Based multilayered structures

1991; Elsevier BV; Volume: 93; Linguagem: Inglês

10.1016/0304-8853(91)90389-r

1873-4766

D. H. Mosca, A. Barthélémy, F. Pétroff, A. Fert, P. A. Schroeder, W. P. Pratt, R. Laloee, R. Cabanel,

Metallic Glasses and Amorphous Alloys

Magnetoresistance measurements have been made on sputtered multilayerd films of Ag/Co and Cu/Co. Magnetoresistances as high as 16% at 4.2 K have been measured in the field range where the magnetization reverses. The results are ascribed to the partial antiparallel arrangement of the magnetizations in alternate Co layers.