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Sulfur passivation of InGaAs/AlGaAs SQW laser (977 nm) facets in alcohol-based solutions

1997; Elsevier BV; Volume: 44; Issue: 1-3 Linguagem: Inglês

10.1016/s0921-5107(96)01817-x

ISSN

1873-4944

Autores

В. Н. Бессолов, М. В. Лебедев, Yuri M. Shernyakov, B. V. Tsarenkov,

Tópico(s)

Laser Material Processing Techniques

Resumo

Sulfide treatment of InGaAs/AlGaAs SWQ lasers (λ = 977 nm) in alcohol-based solutions increases the catastrophic optical damage limit. This increase is largest (50%) when the solvent with the lowest dielectric constant (tert-butanol) is used.

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