Ferroelectric LiTaO 3 thin film annealed in an electric field
1994; Taylor & Francis; Volume: 4; Issue: 1 Linguagem: Inglês
10.1080/10584589408018655
ISSN1607-8489
AutoresA. Kandušer, B. Žigon, Dj. Mandrino, Marija Kosec, P. Panjan, B. B. Lavrenčič,
Tópico(s)Acoustic Wave Resonator Technologies
ResumoAbstract LiTaO3 thin film from have been obtained by RF-magnetron sputtering from monocrystalline target. The films have been deposited on (111) silicon and platinum without substrate heating. The amorphous films were subsequently annealed in the electric field. The morphology, crystal structure and composition of the films were investigated by means of XRD, SEM and AES spectroscopies. The influence of the annealing treatment in the electric field on the morphology and crystal structure of films is significant. The films grown in this fashion are preferentially oriented with the c-axis perpendicular to the surface of substrates and stoichiometric.
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