Artigo Revisado por pares

Crystal structure of [CF3CFC(CF3)Ag]4 and its use as a chemical vapor deposition precursor for silver films

1993; Elsevier BV; Volume: 449; Issue: 1-2 Linguagem: Inglês

10.1016/0022-328x(93)80124-t

ISSN

1872-8561

Autores

Patrick M. Jeffries, Scott R. Wilson, Gregory S. Girolami,

Tópico(s)

Advanced Chemical Physics Studies

Resumo

Silver films have been prepared by the metal-organic chemical vapor deposition of perfluoro-1-methyl-1-propenylsilver tetramer, [CF3CFC(CF3)Ag]4, at 275°C and 10−4 Torr; the silver films contain only traces (< 1%) of fluorine and oxygen and no carbon. The principal organic byproducts formed during deposition are trans-CF3CFCH(CF3) (50%) and CF3CCCF3 (40%). It is argued that silver metal is produced by elimination of CF3CCCF3 from trans-[CF3CFC(CF3)Ag]4 to form silver(I) fluoride, which defluorinates to form silver metal. The crystal structure of trans-[CF3CFC(CF3)Ag]4 was determined and reveals that this compound is a tetramer that consists of a square plane of silver atoms in which each edge is bridged by a trans-perfluoro-1-methyl-1-propenyl ligand. The average distances and angles are: AgAg = 2.761 Å, AgC = 2.19 Å, AgCAg = 78.3° and CAgC = 166.7°. Crystal data: monoclinic, space group P21/c, a = 9.480(5) Å, b = 15.589(6) Å, c = 18.919(4) Å, β = 90.27(3)°, V = 2796(4) Å3, Z = 4, Rf = 0.070, and RwF = 0.089 on 433 variables and 3617 data with I > 2.58 σ(I).

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