The effects of TiAl interlayer on PVD TiA1N films
1998; Elsevier BV; Volume: 99; Issue: 1-2 Linguagem: Inglês
10.1016/s0257-8972(97)00104-7
ISSN1879-3347
AutoresDing‐Fwu Lii, Jow‐Lay Huang, Ming‐Hung Lin,
Tópico(s)Boron and Carbon Nanomaterials Research
ResumoTiAlN films with a TiAl interlayer were deposited on high-speed steel through a reactive sputtering process. A semi-coherent interface was observed between TiAl and TiAlN. Owing to the diffusion of nitrogen, a good bonding had formed between these layers. The TiAl interlayer substantially increased the adhesive strength of TiAlN films and, therefore, significantly affected the wear behavior. In addition, TiAlN films with a 1 μm TiAl interlayer exhibited the highest wear resistance.
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