Fabrication of electrode arrays in the quarter micron regime for biotechnological applications
1995; Elsevier BV; Volume: 46; Issue: 1-3 Linguagem: Inglês
10.1016/0924-4247(94)00863-d
ISSN1873-3069
AutoresK. Reimer, Christian Köhler, Thomas Lisec, Uwe Schnakenberg, G. Fuhr, R. Hintsche, B. Wagner,
Tópico(s)Electrohydrodynamics and Fluid Dynamics
ResumoAbstract In the field of biotechnological microsystems there is a strong demand for the fabrication of ultraminiaturised electrodes. Examples are highly sensitive biosensors or electric field induced handling of biological cells and macromolecules. New effects and thus new fields of applications appear when the electrode dimensions reach the 100 nm scale. This paper presents two alternative technologies for the fabrication of biocompatible microelectrodes: a platinum lift-off process and a gold electroplating process. The lithography was performed with a Leica EBPG 4 HR electron-beam writer at 50 kV acceleration voltage. An electrode size dependent exposure dose was calculated from the effect of backscattered electrons (proximity effect). Evaporated platinum lines with 200 nm spaces could be realized. The electrodes are embedded in SiO 2 yielding a nearly planar surface. In the second case 140 nm gold lines with 60 nm spaces were electroplated using a sulphitic plating solution.
Referência(s)