Deep-Ultraviolet Light-Emitting Diodes Fabricated on AlN Substrates Prepared by Hydride Vapor Phase Epitaxy
2012; Institute of Physics; Volume: 5; Issue: 12 Linguagem: Inglês
10.1143/apex.5.122101
ISSN1882-0786
AutoresToru Kinoshita, Keiichiro Hironaka, Toshiyuki Obata, Toru Nagashima, Rafael Dalmau, R. Schlesser, Baxter Moody, Jinqiao Xie, Shin‐ichiro Inoue, Yoshinao Kumagai, Akinori Koukitu, Zlatko Sitar,
Tópico(s)Plasma Diagnostics and Applications
ResumoAlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) were fabricated on AlN substrates. The AlN substrates were prepared by growing thick hydride vapor phase epitaxy (HVPE)-AlN layers on bulk AlN substrates prepared by physical vapor transport (PVT). After growing an LED structure, the PVT-AlN substrates were removed by mechanical polishing. This process allowed the fabrication of DUV-LEDs on HVPE-AlN substrates with high crystalline quality and DUV optical transparency. The DUV-LEDs exhibited a single emission peaking at 268 nm through the HVPE-AlN substrates. The output power as high as 28 mW was obtained at an injection current of 250 mA.
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