Plasma Screening of Funnel Fields
1985; Institute of Electrical and Electronics Engineers; Volume: 32; Issue: 6 Linguagem: Inglês
10.1109/tns.1985.4334075
ISSN1558-1578
AutoresR. M. Gilbert, Gregory K. Ovrebo, J. Schifano,
Tópico(s)Ion-surface interactions and analysis
ResumoA plasma screening factor has been added to the McLean-Oldham effective funnel length model. Based on the skin depth concept, the factor is intended to provide for plasma screening of funnel fields in heavy-ion tracks crossing reverse-biased silicon and gallium arsenide junctions. Comparisons between screened-funnel predictions of prompt charge collection and experimental data show improved predictive accuracy at low and intermediate values of junction bias.
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