Resolution limits of optical lithography
1991; American Institute of Physics; Volume: 9; Issue: 6 Linguagem: Inglês
10.1116/1.585650
ISSN1520-8567
Autores Tópico(s)Nanofabrication and Lithography Techniques
ResumoThe development of optical lithography has promoted the development of ultralarge scale integration (ULSI) devices. However, optical lithography is now facing serious obstacles due to the limitations in wavelength. Higher resolution with sufficient depth of focus is the most important requirement for ULSI engineers. To satisfy this requirement, many technologies for resolution improvement and new optical image formation technologies such as phase shifting and focus latitude enhancement exposure (FLEX) are reviewed, and a future perspective on optical lithography is also discussed in this paper.
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