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Polymer gratings with low surface relief based on photopolymerization-induced internal diffusion

2004; American Institute of Physics; Volume: 84; Issue: 16 Linguagem: Inglês

10.1063/1.1728297

1520-8842

Jinbo Zhou, Changzheng Sun, Bing Xiong, Jian Wang, Yi Luo,

Photorefractive and Nonlinear Optics

A photopolymer formulation sensitive to 325 nm ultraviolet light is proposed for the fabrication of polymer gratings based on photopolymerization-induced internal diffusion process. A very low surface relief depth ranging from 12.4 to about 1.0 nm has been demonstrated with a refractive index modulation Δn of about 0.010. Such polymer gratings show promising potentials for the fabrication of low-order distributed feedback polymer lasers.