High-Spatial-Resolution Topographic Imaging and Dimer Distance Analysis of Si(100)-(2×1) Using Noncontact Atomic Force Microscopy
2008; Institute of Physics; Volume: 47; Issue: 7S2 Linguagem: Inglês
10.1143/jjap.47.6085
ISSN1347-4065
AutoresDaisuke Sawada, Takashi Namikawa, Masuhiro Hiragaki, Yoshiaki Sugimoto, Masayuki Abe, Seizo Morita,
Tópico(s)Mechanical and Optical Resonators
ResumoThe distance between bright spot in a dimer on the Si(100)-(2×1) surface imaged by noncontact atomic force microscopy (NC-AFM) is analyzed. We used in the analysis only high-spatial-resolution topographic NC-AFM images obtained using different tips at room temperature. Atoms in the dimer was clearly resolved, which enabled us to analyze the distance between two bright spots in the dimer statistically. The average distance was similar to that obtained in a previous study and the theoretical predition. The results indicated that dimer flipping was induced by the AFM tip during scanning and upper–upper atoms are imaged at room temperature.
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