Aluminium and gallium alkyls and their derivatives: spectroscopic and laser pyrolysis studies of metal deposition precursors
1992; Elsevier BV; Volume: 112; Linguagem: Inglês
10.1016/0010-8545(92)80008-f
ISSN1873-3840
Autores Tópico(s)Electron and X-Ray Spectroscopy Techniques
ResumoA. Introduction and background B. The chemistry of the semi-conductor industry. C. Experimental methodologies D. Investigations, results, and comments (i) Trimethyl aluminium, TMAl. (ii) Dimethyl aluminium hydride, DMAlH (iii) Exchange reactions in aluminium and gallium precursors (a) TMAl and TMGa (b) TMAl+DMAlH or DMAID (c) TMGa+DMAlH or DMAlD (iv) Exchange studies of trimethylamine alane and trialkylgallium compounds. (v) IR LPHP of TMGa (vi) IR LPHP of triethylgallium, TEGa. (vii) IR LPHP of tributyl gallium compounds. (viii)IR LPHP of mixtures of TMGa and TEGa E. Conclusions and outlook Acknowledgements References Appendix 131 132 134 136 136 142 146 146 146 148 149 152 155 159 162 165 165 166 168
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