Artigo Revisado por pares

Fabrication of freestanding LiNbO3 thin films via He implantation and femtosecond laser ablation

2010; American Institute of Physics; Volume: 28; Issue: 3 Linguagem: Inglês

10.1116/1.3384056

ISSN

1520-8559

Autores

Ophir Gaathon, Avishai Ofan, Jerry I. Dadap, Lakshmanan Vanamurthy, Sasha Bakhru, H. Bakhru, Richard M. Osgood,

Tópico(s)

Photorefractive and Nonlinear Optics

Resumo

The authors report using a combination of ion-implantation exfoliation and femtosecond laser ablation to fabricate thin (micrometers-thick) single-crystal films of a complex oxide, LiNbO3. The process physics for the method is bounded by the threshold for ablation and the onset of laser thermal outdiffusion of the implanted He used in exfoliation selective etching.

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