Fabrication of freestanding LiNbO3 thin films via He implantation and femtosecond laser ablation
2010; American Institute of Physics; Volume: 28; Issue: 3 Linguagem: Inglês
10.1116/1.3384056
ISSN1520-8559
AutoresOphir Gaathon, Avishai Ofan, Jerry I. Dadap, Lakshmanan Vanamurthy, Sasha Bakhru, H. Bakhru, Richard M. Osgood,
Tópico(s)Photorefractive and Nonlinear Optics
ResumoThe authors report using a combination of ion-implantation exfoliation and femtosecond laser ablation to fabricate thin (micrometers-thick) single-crystal films of a complex oxide, LiNbO3. The process physics for the method is bounded by the threshold for ablation and the onset of laser thermal outdiffusion of the implanted He used in exfoliation selective etching.
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