Characterization and optimization of zinc oxide films by r.f. magnetron sputtering
1997; Elsevier BV; Volume: 295; Issue: 1-2 Linguagem: Inglês
10.1016/s0040-6090(96)09274-7
ISSN1879-2731
AutoresKalpathy B. Sundaram, Arshad Khan,
Tópico(s)Gas Sensing Nanomaterials and Sensors
ResumoZinc oxide films were deposited by a r.f. magnetron sputtering using a zinc oxide target. The deposited films were characterized as a function of deposition temperature, pressure, argon-oxygen gas flow ratio, target-substrate distance. The deposition conditions were optimized to give good quality films suitable for the fabrication of surface acoustic wave device. The films deposited at temperatures as low as 250 °C yielded surface acoustic wave device quality.
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