Influence of substrate temperature on mechanical, optical and electrical properties of ZnO:Al films
2010; Elsevier BV; Volume: 508; Issue: 2 Linguagem: Inglês
10.1016/j.jallcom.2010.08.034
ISSN1873-4669
AutoresRui‐Tao Wen, Laisen Wang, Xuan Wang, Guanghui Yue, Yuanzhi Chen, Dong‐Liang Peng,
Tópico(s)Gas Sensing Nanomaterials and Sensors
ResumoThe Al-doped zinc oxide (ZnO:Al) films were prepared on quartz glass flakes and silicon wafers by radio frequency (RF) magnetron sputtering which uses an aluminum-doped zinc oxide ceramic target. Meanwhile, their properties were characterized by scanning electron microscopy, X-ray diffraction, infrared-UV spectrophotometry, resistance measurement, nano-scratch and indentation test. Evolutions of the structural, optical, electrical and mechanical properties of the ZnO:Al films as a function of substrate temperatures ranging from room temperature to 400 °C were analyzed. The results indicate that the ZnO:Al films with a low resistivity value of 4.97 × 10−4 Ω cm, a relatively higher adhesion and a high transparency above 90%, can be prepared at a substrate temperature of 400 °C.
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