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Spectroscopic studies of laser ablated ZnO plasma and correlation with pulsed laser deposited ZnO thin film properties

2010; Cambridge University Press; Volume: 28; Issue: 1 Linguagem: Inglês

10.1017/s0263034610000029

1469-803X

Gaurav Shukla, Alika Khare,

Laser-induced spectroscopy and plasma

Abstract In this paper, measurement of various plasma parameters during pulsed laser deposition of ZnO thin films on Si (100) substrates is reported. The variations of electron number density and electron temperature with ambient pressure and target substrate distance is obtained via spectroscopic measurements. The structural and optical properties of ZnO thin films were analyzed using X-ray diffraction, scanning electron microscope, and photoluminescence and then correlated with spectroscopic results to find optimum conditions for the deposition of high quality ZnO thin films.