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High-Temperature Microfluidic Lithography

2002; Volume: 14; Issue: 21 Linguagem: Inglês

10.1002/1521-4095(20021104)14

1521-4095

Dario Pisignano, E. Sariconi, Marco Mazzeo, Giuseppe Gigli, R. Cingolani,

Nanofabrication and Lithography Techniques

Advanced MaterialsVolume 14, Issue 21 p. 1565-1567 Communication High-Temperature Microfluidic Lithography D. Pisignano, D. Pisignano dario.pisignano@unile.it National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorE. Sariconi, E. Sariconi National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorM. Mazzeo, M. Mazzeo National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorG. Gigli, G. Gigli National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorR. Cingolani, R. Cingolani National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this author D. Pisignano, D. Pisignano dario.pisignano@unile.it National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorE. Sariconi, E. Sariconi National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorM. Mazzeo, M. Mazzeo National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorG. Gigli, G. Gigli National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this authorR. Cingolani, R. Cingolani National Nanotechnology Laboratory (NNL) of the Istituto Nazionale di Fisica della Materia (INFM), c/o Dipartimento di Ingegneria dell'Innovazione, via Arnesano, I-73100 Lecce, ItalySearch for more papers by this author First published: 04 November 2002 https://doi.org/10.1002/1521-4095(20021104)14:21 3.0.CO;2-WCitations: 23AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onFacebookTwitterLinked InRedditWechat Abstract Large-area polymer patterns can now be easily obtained using microfluidic lithography, under conditions that overcome the slow pattern formation inherent to this technique. The strong temperature dependence of the viscosity of the polymers employed in microfluidic lithography is exploited to increase the filling rate of the elastomeric microchannels. The throughput of high-temperature lithography in capillaries by polyurethane can be increased by up to a factor of 60 with respect to the room-temperature process. In addition, the method can be applied to any kind of substrate and a variety of liquids. Citing Literature Volume14, Issue21November, 2002Pages 1565-1567 RelatedInformation