Selective deposition of anatase and rutile films by KrF laser chemical vapor deposition from titanium isopropoxide
2002; Elsevier BV; Volume: 406; Issue: 1-2 Linguagem: Inglês
10.1016/s0040-6090(01)01748-5
ISSN1879-2731
AutoresAkio Watanabe, T. Tsuchiya, Y. Imai,
Tópico(s)Laser-Ablation Synthesis of Nanoparticles
ResumoTitanium oxide films were prepared by a KrF laser chemical vapor deposition technique from sublimated titanium isopropoxide at substrate temperatures (328–573 K), the laser repetition rates (10–100 Hz) and supply rates of the precursor (60–300 mg/h) on a quartz substrate under the fixed laser fluence of 450 J/m2. The deposits prepared were rutile and/or anatase in any experimental condition used. Low substrate temperature, low laser repetition rate, and high supply rate of the precursor is favorable to the rutile formation. Dependence of the rate of deposition per pulse on these factors and interrelations among these experimental conditions are discussed.
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