Artigo Revisado por pares

Dynamic charge storage in 6H silicon carbide

1992; American Institute of Physics; Volume: 61; Issue: 10 Linguagem: Inglês

10.1063/1.107641

ISSN

1520-8842

Autores

Chester Thad Gardner, James A. Cooper, M. R. Melloch, John W. Palmour, C. H. Carter,

Tópico(s)

Semiconductor materials and interfaces

Resumo

pn-junction storage capacitors have been fabricated in 6H silicon carbide. The charge decay is dominated by surface generation at the mesa edges, and the storage time strongly depends on the method of surface passivation. Charge recovery is thermally activated. Devices passivated by dry oxidation and by wet oxidation exhibit activation energies of 0.66 and 1.48 eV, respectively. As a figure of merit, extrapolation of the dry-oxide data gives a room-temperature storage time of 106 s, while extrapolation of the wet-oxide data gives a room-temperature storage time of 1014 s.

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