Epi-n-IZO thin films/〈100〉 Si, GaAs and InP by L-MBE––a novel feasibility study for SIS type solar cells
2004; Elsevier BV; Volume: 77; Issue: 2 Linguagem: Inglês
10.1016/j.solener.2004.04.006
ISSN1471-1257
AutoresK. Ramamoorthy, M. Jayachandran, K. Sankaranarayanan, Pankaj Misra, L. M. Kukreja, C. Sanjeeviraja,
Tópico(s)Chalcogenide Semiconductor Thin Films
ResumoAbstract High quality epitaxial indium zinc oxide (heavily indium oxide doped) (epi-n-IZO) thin films were optimized by laser-molecular beam epitaxy (L-MBE) i.e., pulsed laser deposition (PLD) technique for fabricating novel iso- and hetero-semiconductor–insulator–semiconductor (SIS) type solar cells using Johnson Matthey “specpure”- grade 90% In 2 O 3 mixed 10% ZnO (as commercial indium tin oxide (ITO) composition) pellets. The effects of substrate temperatures, substrates and heavy indium oxide incorporation on IZO thin film growth, opto-electronic properties with 〈1 0 0〉 silicon (Si), gallium arsenide (GaAs) and indium phosphide (InP) wafers were studied. As well as the feasibility of developing some novel models of iso- and hetero-SIS type solar cells using epi-IZO thin films as transparent conducting oxides (TCOs) and 〈1 0 0〉 oriented Si, GaAs and InP wafers as base substrates was also studied simultaneously. The optimized films were highly oriented, uniform, single crystalline approachment, nano-crystalline, anti-reflective (AR) and epitaxially lattice matched with 〈1 0 0〉 Si, GaAs and InP wafers without any buffer layers. The optical transmission T (max) ⩾ 95% is broader and absolute rivals that of other TCOs such as ITO. The highest conductivity observed is σ =0.47×10 3 Ω −1 cm −1 (n-type), carrier density n =0.168×10 20 cm −3 and mobility μ =123 cm 2 /V s. From opto-electronic characterizations, the solar cell characteristics and feasibilities of fabricating respective epi-n-TCO/〈1 0 0〉 wafer SIS type solar cells were confirmed. Also, the essential parameters of these cells were calculated and tabulated. We hope that these data be helpful either as a scientific or technical basis in semiconductor processing.
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