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Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films

1998; Wiley; Volume: 04; Issue: 06 Linguagem: Inglês

10.1002/(sici)1521-3862(199812)04

1521-3862

Daniel G. Colombo, D. C. Gilmer, Victor G. Young, Stephen A. Campbell, Wayne L. Gladfelter,

Semiconductor materials and devices

Chemical Vapor DepositionVolume 4, Issue 6 p. 220-222 Communication Anhydrous Metal Nitrates as Volatile Single Source Precursors for the CVD of Metal Oxide Films Daniel G. Colombo, Daniel G. ColomboSearch for more papers by this authorDavid C. Gilmer, David C. Gilmer Department of Chemistry, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this authorVictor G. Young Jr., Victor G. Young Jr. Department of Chemistry, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this authorStephen A. Campbell, Stephen A. Campbell Department of Electrical Engineering, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this authorWayne L. Gladfelter, Wayne L. Gladfelter Department of Chemistry, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this author Daniel G. Colombo, Daniel G. ColomboSearch for more papers by this authorDavid C. Gilmer, David C. Gilmer Department of Chemistry, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this authorVictor G. Young Jr., Victor G. Young Jr. Department of Chemistry, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this authorStephen A. Campbell, Stephen A. Campbell Department of Electrical Engineering, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this authorWayne L. Gladfelter, Wayne L. Gladfelter Department of Chemistry, University of Minnesota, Minneapolis, MN 55455 (USA)Search for more papers by this author First published: 20 September 2007 https://doi.org/10.1002/(SICI)1521-3862(199812)04:06 3.0.CO;2-ECitations: 86AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat Abstract Anhydrous metal nitrates are useful as single source precursors for CVD of metal oxide films. MOCVD of such films can lead to incorporation of carbon or hydrogen into the films, so single source precursors that cleave directly to metal oxide films with highly volatile byproducts are desirable. In this communication it is shown that, with relatively little optimization, anhydrous metal nitrates exhibit the necessary volatility and reactivity for CVD applications. References 1 H. Treichel, A. Mitwalsky, G. Tempel, G. Zorn, D. A. Bohling, K. R. Coyle, B. S. Felker, M. George, W. Kern, A. P. Lane, N. P. Sandler, Adv. Mater. Opt. Electron. 1995, 5, 163. 10.1002/amo.860050305 CASWeb of Science®Google Scholar 2 S. A. Campbell, D. C. Gilmer, X.-C. Wang, M.-T. Hsieh, H.-S. Kim, W. L. Gladfelter, J. Yan, IEEE Trans. Electron. Dev. 1997, 44, 104. 10.1109/16.554800 CASWeb of Science®Google Scholar 3 D. C. Gilmer, D. G. Colombo, C. J. Taylor, J. Roberts, G. Haugstad, S. A. Campbell, H.-S. Kim, G. D. Wilk, M. A. Gribelyuk, W. L. Gladfelter, Chem. Vap. Deposition 1998, 4, 9. 10.1002/(SICI)1521-3862(199801)04:01 3.0.CO;2-3 CASWeb of Science®Google Scholar 4 B. O. Field, C. J. Hardy, Proc. Chem. Soc. 1962, 76–77. Google Scholar 5 C. C. Addison, W. B. Simpson, J. Chem. Soc. 1965, 598. Google Scholar 6 R. J. Fereday, N. Logan, D. Sutton, J. Chem. Soc. 1969, 2699. Google Scholar 7 D. Bowler, N. Logan, J. Chem. Soc., Chem. Commun. 1971, 582. Google Scholar 8 A. D. Harris, J. C. Trebellas, H. B. Jonassen, Inorg. Synth. 1967, 9, 83. 10.1002/9780470132401.ch23 CASGoogle Scholar 9 C. D. Garner, S. C. Wallwork, J. Chem. Soc. 1966, 1496. Google Scholar 10 C. D. Garner, D. Sutton, S. C. Wallwork, J. Chem. Soc. 1967, 1949. Google Scholar 11 J. Weidlein, U. Müller, K. Dehnicke, Spectrochimica Acta 1968, 24A, 253. 10.1016/0584-8539(68)80067-4 Web of Science®Google Scholar 12 C. C. Addison, N. Logan, Adv. Inorg. Chem. Radiochem. 1964, 6, 71. 10.1016/S0065-2792(08)60225-3 CASWeb of Science®Google Scholar 13 J. Laane, J. R. Ohlsen, Prog. Inorg. Chem. 1980, 27, 465. 10.1002/9780470166284.ch6 CASGoogle Scholar 14 R. I. Bickley, R. K. M. Jayanty, J. A. Navio, C. Real, M. Macias, Surf. Sci. 1991, 251/252, 1052. 10.1016/0039-6028(91)91149-R Web of Science®Google Scholar Citing Literature Volume4, Issue6December 1998Pages 220-222 ReferencesRelatedInformation