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Linear Extended ArcJet‐CVD – a New PECVD Approach for Continuous Wide Area Coating Under Atmospheric Pressure

2005; Wiley; Volume: 11; Issue: 11-12 Linguagem: Inglês

10.1002/cvde.200406343

1521-3862

V. Hopfe, D. Rogler, G. Maeder, Ines Dani, K. Landes, Eckart Theophile, M. Dzulko, Cynthia Rohrer, C. Reichhold,

Metal and Thin Film Mechanics

Abstract A new type of DC‐powered plasma source (LARGE) was developed and evaluated for continuous plasma‐enhanced (PE) CVD under atmospheric pressure. The linear extended emanating plasma sheet was scaled‐up to various working widths with the result that a half meter range has already been achieved. A CVD reactor was designed for continuous deposition of non‐oxide materials. The reactor operates in a remote atmospheric pressure (AP) PECVD configuration with typical deposition rates of 5–50 nm s –1 (static) and 0.1–1.0 nm m s –1 (dynamic). The potential application range of the ArcJet‐CVD technology was evaluated by screening studies with various substrates, (stainless steel, glass, silicon wafers) and coating materials (silica, carbon, silicon nitride). In‐situ process characterization has been provided by both optical emission and Fourier transform infrared (FTIR) spectroscopy. A range of atomic and molecular intermediates, precursor fragments, and reaction products were identified, leading to the conclusion that a complete conversion of the element‐organic precursors into an inorganic layer takes place.