Low-Temperature Crystallization of Sol-Gel Derived Pb(Zr 0.4 ,Ti 0.6 )O 3 Thin Films
2001; Institute of Physics; Volume: 40; Issue: 9S Linguagem: Inglês
10.1143/jjap.40.5533
ISSN1347-4065
AutoresKazunari Maki, Nobuyuki Soyama, Kaoru Nagamine, Satoru Mori, Katsumi Ogi,
Tópico(s)Microwave Dielectric Ceramics Synthesis
ResumoWe have studied the crystallization of sol-gel derived Pb(Zr 0.4 Ti 0.6 )O 3 [PZT(40/60)] thin films at 435 down to 420°C. The PZT(40/60) films were prepared at these temperatures on Pt/SiO 2 /Si substrates by a combination of diol-based solutions and modified film preparation processes. Various properties of the PZT(40/60) films such as microstructures, crystal orientation, ferroelectric properties, relative permittivity, and leakage current density were evaluated. It was found that PZT(40/60) films could be crystallized at 435 to 420°C by the diol-based solutions and the modified film preparation processes. The PZT(40/60) films had microstructures with perovskite-single-phase fine columnar grains and good electric characteristics such as remanent polarization ( P r ) of 12 to 15 µC/cm 2 , relative permittivity ( ε r ) of 780, and breakdown voltage of more than 10 V.
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