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Band gap engineering of ZnO thin films by In2O3 incorporation

2008; Elsevier BV; Volume: 310; Issue: 12 Linguagem: Inglês

10.1016/j.jcrysgro.2008.03.004

1873-5002

Ram K. Gupta, K. Ghosh, R. Patel, Sanjay R. Mishra, P.K. Kahol,

Copper-based nanomaterials and applications

Highly transparent and conducting thin films of ZnO–In2O3 were deposited using pulsed laser deposition (PLD) technique. The effect of composition and growth temperature on structural, electrical, and optical properties was studied. The lowest resistivity of 2.11×10−4 Ω cm and high transparency (∼80%) was obtained for the film having 5% In2O3 in ZnO. The band gap of the films depends on doping level and varies from 3.37 to 3.95 eV.