ZnO thin film deposition by laser ablation of Zn target in oxygen reactive atmosphere
1996; Elsevier BV; Volume: 106; Linguagem: Inglês
10.1016/s0169-4332(97)80013-x
ISSN1873-5584
Autores Tópico(s)Tribology and Lubrication Engineering
ResumoZnO thin films were deposited by laser ablation of Zn target in oxygen reactive atmosphere. The films are crystalline, their c-axis is perpendicular to the substrate surface, they exhibit high optical transmission (95% in the visible range, with a step transition at 380 nm), a band gap value of 3.2 eV and a high piezoelectric coefficient. A YAG laser (λ = 1.06 μm, FWHM = 10 ns, 0.3 J/pulse), was used as laser source. The material was collected on different substrates: Si wafers, sapphire, Corning glass plates. The influence of the process parameters on the physical properties of the deposited films was studied. The target-collector distance was varied in the range 4–8 cm, the oxygen pressure was set between 10−3 mbar and 10−1 mbar, the collectors were heated at different temperatures between 20 and 350°C. Cross-section scanning electron microscopy, optical transmission spectra, X-ray diffraction and electroacoustic studies were performed to characterize the deposited films.
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