Origin of orientation of K(Ta 0.65 Nb 0.35 ) O 3 thin films prepared by sol-gel processing
1996; Taylor & Francis; Volume: 188; Issue: 1 Linguagem: Inglês
10.1080/00150199608244880
ISSN1563-5112
AutoresDinghua Bao, Haoshuang Gu, Anxiang Kuang,
Tópico(s)Advanced ceramic materials synthesis
ResumoAbstract Expitaxial and highly oriented K(Ta0.65Nb0.35)O3 thin films were prepared on (100) SrTiO3 and (100) Mgo single crystal plates by sol-gel processing, using a multilayer sprinning method. The preparation process and the thin film characterization were studied by x-ray diffraction (XRD) and reflection high energy electron diffraction (RHEED). The mechanism of orientation of K(Ta0.65Nb0.35)O3 films was discussed in detail. The substrate strongly influenced on the film orientation, and the concentration of the precursor solution and heat-treatment conditions were also found to affect the orientation of the thin films.
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