Photogenerated base in polymer curing and imaging: Design of reactive styrenic copolymers susceptible to a base-catalyzed ?-elimination
1997; Wiley; Volume: 35; Issue: 16 Linguagem: Inglês
10.1002/(sici)1099-0518(19971130)35
ISSN1099-0518
AutoresEdward J. Urankar, Jean M. J. Fr�chet,
Tópico(s)Advanced Polymer Synthesis and Characterization
ResumoA novel family of functionalized styrenic copolymers that are susceptible to a base-catalyzed β-elimination reaction is reported. The reactive copolymers, poly-{(2-phenyl-2-cyanoethoxycarbonyloxystyrene)-co-(4-hydroxystyrene)}, are prepared by chemical modification of poly(4-hydroxystyrene) using 2-phenyl-2-cyanoethyl chloroformate. A photoresist material consisting of the copolymer and bis[[(2-nitrobenzyl)-oxy] carbonyl]-4,4′-trimethylenedipiperidine used as an amine photogenerator affords positive tone images by UV irradiation. The effect of copolymer structure and composition on imaging, thermal stability, and the ease of β-elimination reaction is discussed. © 1997 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 35: 3543–3552 1997
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