Plasma-assisted Molecular Beam Epitaxy of High Optical Quality MgZnO Films on Zn-polar ZnO Substrates
2008; Institute of Physics; Volume: 1; Linguagem: Inglês
10.1143/apex.1.091202
ISSN1882-0786
AutoresYoshio Nishimoto, Ken Nakahara, Daiju Takamizu, Atsushi Sasaki, Kentaro Tamura, Shunsuke Akasaka, Hiroyuki Yuji, Tetsuo Fujii, Tetsuhiro Tanabe, H. Takasu, Atsushi Tsukazaki, Akira Ohtomo, Takeyoshi Onuma, Shigefusa F. Chichibu, M. Kawasaki,
Tópico(s)Copper-based nanomaterials and applications
ResumoThe excellent structural and optical properties of pseudomorphic MgxZn1-xO films (0≤x≤0.39) are reported in this work. The MgxZn1-xO films were grown on Zn-polar ZnO substrates by plasma-assisted molecular beam epitaxy. Those MgxZn1-xO films for which x≤0.18 exhibited atomically flat surfaces, and the typical full-width-at-half-maximum (FWHM) value of the (0002) X-ray diffraction ω-rocking curves for these films was 35 arcsec. The FWHM values were less than 100 meV for the near-band-edge photoluminescence (PL) at 300 K. We observed PL lifetimes of the order of ns, and the longest fast-decay component reached 3.5 ns for the Mg0.12Zn0.88O alloy.
Referência(s)