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Nano-micro Processing of Epoxy Resin Systems by Ion Beam Lithography with Multiple Energies and Species

2011; Materials Research Society of Japan; Volume: 36; Issue: 3 Linguagem: Inglês

10.14723/tmrsj.36.305

2188-1650

Katsuyoshi Takano, Takahiro Satoh, Yasuyuki Ishii, Masashi Koka, Tomihiro Kamiya, Takeru Ohkubo, Masaki Sugimoto, Hiroyuki Nishikawa, Shu Seki,

Integrated Circuits and Semiconductor Failure Analysis

Techniques of superimposed ion beam writing with different energies and species have been developed at Takasaki Ion Accelerators for Advanced Radiation Application facility, TIARA, of JAEA/Takasaki. A bridge structure was fabricated by the superimposed writing of a girder pattern with 0.5 MeV proton beam adjusting to the bridge pier pattern written with 3 MeV proton beam, using SU-8 photoresist films coated on cured epoxy resin sheets. An upstanding column array by the bridge structure was fabricated by the spot pattern writing of focused 260 MeV Ne7+ beam, aiming to the girder pattern. In the spot pattern writing, the events of single ion hit were detected with 500 hits per spots. This is the first report about the three dimensional micro fabrication using the focused heavy ion beam with several hundred MeV at the countable fluence. The establish of basic techniques for the fabrication of upstanding fine wire array was shown.