TiO2, LiNb3O8, and (Ti x Nb1− x )O2 compound kinetics during Ti:LiNbO3 waveguide fabrication in the presence of water vapors
1985; American Institute of Physics; Volume: 57; Issue: 5 Linguagem: Inglês
10.1063/1.334459
ISSN1520-8850
AutoresM. De Sario, Mario N. Armenise, C. Canali, A. Carnera, P. Mazzoldi, G. Celotti,
Tópico(s)Semiconductor materials and devices
ResumoThe presence of water vapor in the annealing atmosphere during Ti:LiNbO3 optical waveguide fabrication prevents Li out-diffusion, inhibits LiNb3O8 growth, and furthermore decomposes this phase if already formed. As a consequence, the TiO2 and the mixed oxide (TixNb1−x)O2 growth kinetics change. A proton in-diffusion in LiNbO3 with OH− defects and (Li1−yHy)NbO3 molecule formation is suggested to explain these effects and to account for the detected increase of absorbance at 3480 cm−1.
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