980-nm DBR lasers using higher order gratings defined by i-line lithography
2005; IOP Publishing; Volume: 20; Issue: 11 Linguagem: Inglês
10.1088/0268-1242/20/11/009
ISSN1361-6641
AutoresJ. Fricke, H. Wenzel, Mathias Matalla, A. Klehr, G. Erbert,
Tópico(s)Semiconductor Lasers and Optical Devices
ResumoWe report on the simultaneous definition and fabrication of Bragg gratings and ridge waveguides using wafer stepper lithography and reactive ion etching, respectively. Single-longitudinal mode emission from two-section ridge-waveguide distributed feedback lasers with sixth and seventh order gratings will be reported. This technology enables a cheap fabrication of wavelength-stabilized lasers and a simple variation of the parameters of the gratings on the wafer using optical lithography.
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