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Cleaning graphene using atomic force microscope

2012; American Institute of Physics; Volume: 111; Issue: 6 Linguagem: Inglês

10.1063/1.3695451

1520-8850

Niclas Lindvall, Alexey Kalabukhov, A. Yurgens,

Advancements in Semiconductor Devices and Circuit Design

We mechanically clean graphene devices using an atomic force microscope (AFM). By scanning an AFM tip in contact mode in a broom-like way over the sample, resist residues are pushed away from the desired area. We obtain atomically flat graphene with a root mean square (rms) roughness as low as 0.12 nm after this procedure. The cleaning also results in a shift of the charge-neutrality point toward zero gate voltage, as well as an increase in charge carrier mobility.