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Negative-type extreme ultraviolet Resist Materials based on Water-Wheel-like Cyclic Oligomer (Noria)

2010; Institute of Physics; Volume: 49; Issue: 6S Linguagem: Inglês

10.1143/jjap.49.06gf06

1347-4065

Hiroyuki Seki, Yuki Kato, Hiroto Kudo, Hiroaki Oizumi, Toshiro Itani, Tadatomi Nishikubo,

Photochromic and Fluorescence Chemistry

The synthesis and properties of noria derivatives containing oxetanyl groups were investigated for their application as negative-type extreme ultraviolet (EUV) resist materials. The solubility, film-forming ability, and photochemical reactivity were consistent with the structures of noria derivatives. The patterning properties of the synthesized noria derivatives were also examined using an EUV system, and patterns with 45 and 50 nm half-pitch resolution were obtained.