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In-situ local temperature measurement during three-dimensional direct laser writing

2013; American Institute of Physics; Volume: 103; Issue: 12 Linguagem: Inglês

10.1063/1.4821556

1520-8842

Jonathan B. Mueller, Joachim Fischer, Yatin J. Mange, Thomas Nann, Martin Wegener,

Photorefractive and Nonlinear Optics

We present an approach to measure in situ the local temperature increase in the exposed volume during three-dimensional direct laser writing. The method is based on the detection of luminescence from NaYF4:Yb3+, Er3+ co-doped nanocrystals in a confocal scheme. We found the temperature increase to be below a few K within the normal writing regime. If the photoresist is overexposed, significant temperature changes of several hundred K can be observed.