Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules
2007; Wiley; Volume: 4; Issue: S1 Linguagem: Inglês
10.1002/ppap.200731501
ISSN1612-8869
AutoresYuichi Setsuhara, Kosuke Takenaka, Akinori Ebe, Kazuaki Nishisaka,
Tópico(s)Metal and Thin Film Mechanics
ResumoPlasma Processes and PolymersVolume 4, Issue S1 p. S628-S632 Full Paper Production and Control of Large-Area Plasmas for Meters-Scale Flat-Panel-Display Processing with Multiple Low-Inductance Antenna Modules Yuichi Setsuhara, Corresponding Author Yuichi Setsuhara [email protected] Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, JapanJoining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan. Fax: (+81) 6 6879 8641Search for more papers by this authorKosuke Takenaka, Kosuke Takenaka Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, JapanSearch for more papers by this authorAkinori Ebe, Akinori Ebe EMD Corporation, Kyodai-Katura Venture Plaza, 1-36 Goryouohara-cho, Nishikyou-ku, Kyoto 615-8245, JapanSearch for more papers by this authorKazuaki Nishisaka, Kazuaki Nishisaka EMD Corporation, Kyodai-Katura Venture Plaza, 1-36 Goryouohara-cho, Nishikyou-ku, Kyoto 615-8245, JapanSearch for more papers by this author Yuichi Setsuhara, Corresponding Author Yuichi Setsuhara [email protected] Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, JapanJoining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan. Fax: (+81) 6 6879 8641Search for more papers by this authorKosuke Takenaka, Kosuke Takenaka Joining and Welding Research Institute, Osaka University, 11-1 Mihogaoka, Ibaraki, Osaka 567-0047, JapanSearch for more papers by this authorAkinori Ebe, Akinori Ebe EMD Corporation, Kyodai-Katura Venture Plaza, 1-36 Goryouohara-cho, Nishikyou-ku, Kyoto 615-8245, JapanSearch for more papers by this authorKazuaki Nishisaka, Kazuaki Nishisaka EMD Corporation, Kyodai-Katura Venture Plaza, 1-36 Goryouohara-cho, Nishikyou-ku, Kyoto 615-8245, JapanSearch for more papers by this author First published: 24 May 2007 https://doi.org/10.1002/ppap.200731501Citations: 63Read the full textAboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat Abstract Plasma technologies for meters-scale flat-panel-display (FPD) processing have been developed using multiple low-inductance antenna (LIA) modules to drive inductively coupled plasmas (ICPs), in which RF-power-deposition profiles can be controlled in plasma reactors with a scale as large as meters. The LIA module consisted of a U-shaped internal antenna with dielectric isolation, each of which was coupled to an RF power system for independent power control of driving ICP. Our new proposal of the unique source configuration is based on the principle of multiple operation and integrated control of LIA modules, which allow low-voltage high-density plasma production with active control of power deposition profiles. Multiple LIA modules mounted on the wall of a discharge chamber were independently controlled to attain the desired plasma profiles. Experiments with a meter-scale rectangular reactor resulted in stable source operation to attain high densities >1011 cm−3. Plasma-enhanced chemical vapor deposition of amorphous hydrogenated carbon films showed an excellent control capability of film-thickness distributions to achieve the film-thickness uniformity of 8.6%, which was defined as the value of (maximum thickness − minimum thickness) divided by the average thickness over the substrate area of 410 mm × 520 mm. The obtained results indicate that the plasma production and/or control technologies with the LIA modules are quite attractive as a high-density low-potential plasma source for a variety of FPD processes. References 1 M. A. Lieberman, A. J. Lichtenberg, " Principles of Plasma Discharges and Materials Processing", Wiley, New York 1994. Google Scholar 2 A. A. Howling, J. L. Dorier, C. Hollenstein, U. Kroll, J. Vac. Sci. Technol. A 1992, 10, 1080. 10.1116/1.578205 CASWeb of Science®Google Scholar 3 V. Vahedi, C. K. 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