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Raman scattering as a tool for the evaluation of strain in Ga N ∕ Al N quantum dots: The effect of capping

2007; American Physical Society; Volume: 76; Issue: 16 Linguagem: Inglês

10.1103/physrevb.76.165403

1550-235X

A. Cros, N. Garro, A. Cantarero, Johann Coraux, H. Renevier, B. Daudin,

Metal and Thin Film Mechanics

The strain state of $\mathrm{Ga}\mathrm{N}∕\mathrm{Al}\mathrm{N}$ quantum dots grown on $6H\text{\ensuremath{-}}\mathrm{Si}\mathrm{C}$ has been investigated as a function of AlN capping thickness by three different techniques. On the one hand, resonant Raman scattering allowed the detection of the ${A}_{1}(\mathrm{LO})$ quasiconfined mode. It was found that its frequency increases with AlN deposition, while its linewidth did not evolve significantly. Available experiments of multiwavelength anomalous diffraction and diffraction anomalous fine structure on the same samples provided the determination of the wurtzite lattice parameters $a$ and $c$ of the quantum dots. A very good agreement is found between resonant Raman scattering and x-ray measurements, especially concerning the in-plane strain state. The results demonstrate the adequacy of Raman scattering, in combination with the deformation potential and biaxial approximations, to determine quantitatively values of strain in GaN quantum dot layers.