Low-dimension structural properties and microindentation studies of ion-beam-sputtered multilayers of Ag/Al films
1994; Elsevier BV; Volume: 240; Issue: 1-2 Linguagem: Inglês
10.1016/0040-6090(94)90692-0
ISSN1879-2731
AutoresC Kim, S. B. Qadri, M. R. Scanlon, R. C. Cammarata,
Tópico(s)Ion-surface interactions and analysis
ResumoArtificially modulated silver/aluminum multilayer films with modulation wavelengths Λ between 1.35 and 21.3 nm, and total film thickness of 1 μm were prepared by ion-beam sputtering. The mechanical properties of these films were investigated by a low load muhardness indentation technique. The films displayed increased hardness as the modulation wavelength decreased. X-ray diffraction scans showed well-defined small angle peaks and satellite peaks for high angles indicating a coherent multilayer structure. The hardness enhancement as the modulation wavelength decreases may be partially attributed to the Ag2Al formation at the interfaces. The high quality of the well-defined layer structure is confirmed by the presence of interference maxima corresponding to the number of bilayers in the low angle diffraction data for films with total film thicknessesess than 33.0 nm.
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