Kinetics and Mechanism of Phosphorus Removal from Silicon in Vacuum Induction Refining
2012; Begell House; Volume: 31; Issue: 1 Linguagem: Inglês
10.1515/htmp.2011.143
ISSN2191-0324
AutoresJafar Safarian, Merete Tangstad,
Tópico(s)Metallurgical Processes and Thermodynamics
ResumoAbstract Vacuum induction refining is a process that can be applied to remove phosphorus from molten silicon for the production of solar grade silicon. Pure silicon was doped by phosphorus to make molten silicon containing around 17 ppmw phosphorus. The kinetics of phosphorus removal from this silicon was studied at 0.5 Pa through the application of vacuum induction refining. It was observed that vacuum removal of phosphorus occurs through a first-order reaction. The rate constants of phosphorus evaporation were determined as 2.28
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