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Computer automation of the Pulse Reactor, a pulse operated low-pressure metal organic vapor phase epitaxy machine

1990; American Institute of Physics; Volume: 61; Issue: 1 Linguagem: Inglês

10.1063/1.1141890

1527-2400

Wilfried van Sark, J.E.M. Hogenkamp, J. van Suchtelen, L.J. Giling,

Semiconductor Quantum Structures and Devices

A modular and thereby flexible software package has been developed to control and operate a recently designed Pulse Reactor, a new type of low-pressure metal organic vapor phase epitaxy (MOVPE) machine. The user-friendly software package allows the operator to grow complicated layer structures automatically, whereby the composition of the growth mixture for each growth pulse can be varied. The hardware consists of a VMEbus based microcomputer system in combination with a UNIFIVE [derived from UNIX■ system V (UNIX■ is a trademark of AT&T Bell Laboratories)] operating system. Interfacing with the reactor system is performed through the use of a Philips MIOS subsystem. The UNIFIVE operating system is modified so as to establish good real-time behavior. Multilayer structures consisting of several GaAs and AlGaAs layers have been grown with good results, demonstrating not only the reliability, the real time behavior, and the correctness of the software package, but also the quality of the Pulse Reactor itself.