Quantized hall and transverse resistivities in silicon MOS n-inversion layers
1983; Elsevier BV; Volume: 117-118; Linguagem: Inglês
10.1016/0378-4363(83)90630-7
ISSN1873-2127
AutoresKazuo Yoshihiro, J. Kinoshita, Katsuya Inagaki, Chikako Yamanouchi, J. Moriyama, Shinji Kawaji,
Tópico(s)Semiconductor materials and devices
Referência(s)